Product overview
SENTECH productsEllipsometers und reflektometers
- Products for R&D
- Spectroscopic ellipsometer
-
Reflectometer for materials analysis
- Laser ellipsometer for ultimate precision
- In-line and off-line industrial quality control
- Spectroscopic ellipsometer for automated, routine
measurements - Automatic large area measurement systems
- In-line metrology systems
- Metrology systems for photovoltaic application
- Ellipsometer and reflectometer for the measurement
of antireflective and passivation coatings on silicon solar cells - Horizontal and vertical mapping systems for large area
thin film solar cells
- for the analysis of TCO films (SnO2, AZO, ITO)
- for the analysis of absorber films (a-Si, µ-Si, CdTe,
CdS, CIS, CIGSE)
- for haze mapping systems
- Inline metrology for crystalline Si cells and thin film cell production
- PECVD Plasma deposition systems
- Plasma deposition systems based on CCP
- Plasma deposition systems based on ICP
- Optical monitoring
- RIE Plasma etch systems
- CCP etcher with and without loadlock
- ICP etcher
- Optical process monitoring
- Cluster configurations
- Multiple reactor systems with cassette to cassette loading
- Fully automated ICP and CCP etchers for compound
semiconductor and mask processing
- Applications for industrial production
- Fully automated RIE and ICP etchers for compound
semiconductor production - Cluster tools with 5 reaction chambers for processing
masks and lenses - Plasma etch and deposition equipment for microsystems
technology
- Carrier lifetime measurement of solar silicon
- Mapping of carrier lifetime and photoconductivity
- Characterizing Si properties for microelectronics
- Mapping carrier lifetime and photoconductivity
- LBIC
- Resistivity