ICP-RIE Plasma Etching:

Plasma_cryogenicSiPlasma_lithographyPlasma etching result of VCSEL structure using Ar-Cl2 gas mixtureEtching process result of Si-DRIE (SF6-C4F8-O2) post O2 cleanPlasma etching result of SF6-C4F8 based gas chopping process(IAP-Jena)ICP PECVD TEOS SiO2 film step coverage over Si ridge(IISB-Erlangen)ICP RIE result of SF6O2-C4F8-based Si gas chopping process

What's New?

2016-SENperc-Presentation-SNEC

SENTECH presented the new, innovative SENperc PV – a metrology tool for quality control in PERC solar cell manufacturing. Al2O3/SiNx layer stacks and single films for passivation of PERC solar cells are measured. The SENperc PV was introduced for the first time in China at the SNEC PV Power Expo 2016. →read more

PERC Cells measurement SENperc PV

The new innovative solution for quality control of PERC back side manufacturing is launched. The new SENperc PV was released at the SNEC Show Shanghai 2016 to the Asian market. At the Intersolar Europe, Munich (booth no. A2.214) starting at June 22, the SENperc PV will be released in Europe. You are kindly invited to our booth for live demo. →read more

Upcoming Events:

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SENTECH
Gesellschaft für Sensortechnik mbH

Konrad-Zuse-Bogen 13
82152 Krailling / KIM
Germany

Phone: +49 (0)89 - 89 79 60 70
Fax: +49 (0)89 - 89 79 60 722
Email: sales@sentech.de



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